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Stress distribution to the angle of implantation and impression materials

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Abstract


The purpose of this study was to analyze the stress distribution to the angle of implants at taking impression. Implants were implanted in a photoelastic model at the angle of 0, 10, 20 and 30 degree. Transfer impression pins were connected to the implants and impression were taken by use of polysulfide, poly-vinyl-siloxane and polyether impression materials. At removing impression, stress distribution around implants was analyzed.

The following results were obtained :
1. At taking impression, stress concentration around implants according to the angle of implants was high when the angle of implants was high.
2. Stress concentration around implants according to the kinds of impression materials was the lowest when polysulfide was used, while it was the highest when polyether as used.
3. Stress concentration around implants according to the increase of loadness was unchangeable when polysulfide was used, while it was high when poly-vinyl-siloxane and polyether were used.

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